MBI Colloquium: EUV Lithography – An European Success Story

MBI Colloquium: EUV Lithography – An European Success Story

Wednesday, 07. April 2021 // 14.00

Max-Born-Institut

Virtual Zoom meeting

Logo: MBI

Dr. Wilhelm Kühn, Zeiss Oberkochen

Key bottleneck equipment to pattern the resist on the Si wafer is the lithography scanner. Dutch machine specialist ASML in tight cooperation with German optics specialist ZEISS developed EUV lithography and achieved market dominance over the recent decades. Leading edge chip manufacturing depends crucially on these EUV lithography machines.

Manufacturing of EUV optics requires highly sophisticated optical metrology and coating techniques in particular. A short overview will be given over interferometric measurement principles and current technological challenges. Furthermore an impression of size, the collaboration network and future of the EUV program will be conveyed.
 

If you are interested, but not an institute member:
Please contact Ute.Schlichting@mbi-berlin.de to get the login dates for this event.

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