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28. February 2019

G-ray Nanotech and IKZ join forces to develop detector-grade Gallium Arsenide wafers

New platform for very high performance X-ray detectors

Gallium arsenide single crystal 4", grown with the VGF method | Photo: IKZ
Gallium arsenide single crystal 4", grown with the VGF method | Photo: IKZ

G-ray Nanotech and IKZ have entered into a research and development collaboration covering the doping of Gallium Arsenide structures and the manufacturing of high purity crystals in wafer form factor for detector applications.

"We are delighted to work with a world-leading institute in the field of material sciences," says Philippe Le Corre, CEO of G-ray Nanotech. "The competencies of IKZ will allow us to accelerate significantly the expansion of our latenium™ detector architecture into medium-large energy X-rays applications as well as in the infra-red spectrum."

G-ray Industries SA, a Neuchâtel start-up, is currently developing ultra-high performance detectors dedicated to industrial non-destructive testing solutions. These ultra-high-performance detectors are developed in partnership with CSEM, based on G-ray’s revolutionary patented latenium™ technology.

The latenium™ Evaluation kits are available for evaluation purposes as of Q1-2019. In addition, the G-ray technologies - in particular the covalent bonding of a silicon wafer to a GaAs, Ge or Si wafer at low temperatures and the very fast epitaxial growth of Germanium structures - are being positioned in the fields of high-energy physics research for new particle detectors and in vision systems for the automotive industry.

"We are pleased to start a long-term collaboration with G-ray Industries," says Prof. Thomas Schroeder, IKZ´s Scientific Director. "IKZ is committed to push high performance crystalline materials to market applications and the state-of-the-art X-ray imaging detector development at G-Ray is a nice opportunity for us. We consider 3D heterointegration via bonding approaches as a fruitful strategy for us to innovate technologies by high quality, precisely tailored crystalline materials."

“With our expertise in materials science and technology we have supported the G-ray team right from the start. This is an outstanding opportunity to bring a ground-breaking X-ray detector technology to the market," says Gian-Luca Bona, CEO of Empa, the Swiss Federal Laboratories for Material Science and Technology.

 

Press contact IKZ
Stefanie Grüber
Tel.: +49 30 6392-3263
Email: stefanie.grueber(at)ikz-berlin.de

Contacts:

Leibniz-Institut für Kristallzüchtung (IKZ)
Thomas Schröder
Scientific Director
Tel.: +49 30 6392-3000
Email: thomas.schroeder(at)ikz-berlin.de

G-ray Nanotech SA
Philippe Le Corre
CEO
Mobile: +41 79 171 71 30
Email: philippe.le.corre(at)g-ray.ch

Further Information:

  • www.ikz-berlin.de
  • www.g-ray.ch
  • www.empa.ch
Research Analytics Microsystems / Materials

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Related Institutions

  • Leibniz-Institut für Kristallzüchtung im Forschungsverbund Berlin e.V. (IKZ)
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