Vistec received an order from Ferdinand-Braun-Institute in Berlin
...for one of its Vistec SB250 Series Variable Shaped Beam lithography systems
The Ferdinand-Braun-Institute explores cutting-edge technologies for innovative applications in the field of microwaves and optoelectronics in close co-operation with the industry. The spectrum of work ranges from basic research projects to devices delivered as demonstrators or pilot series to industrial partners.
Installed in the existing process line, the new electron-beam lithography system is required for the development of state-of-the-art electronic and opto-electronic high-power devices based on GaAs and GaN. Additionally, the Vistec SB250 will be used as an in-house mask writer. “The investment is vital for FBH in order to remain competitive. The system’s performance as demonstrated in a series of tests meets our demands and will provide a solid basis for future research and development of high-value products and services.” says Dr. Krueger, Head of Process Technology Department.
The Vistec SB250 Series was designed as a universal and cost-effective electron-beam lithography system for both direct write and mask making applications.
The SB250 as a Variable Shaped Beam system operating at 50kV, is capable to deal with a high variety of substrates (both in terms of types and dimensions) using a maximum stage travel range of 210mm x 210mm in fully automated operation. Excellent lithography performance combined with a high throughput opens possibilities for a wide range of applications.
“We are very glad to continue our long standing partnership with the Ferdinand-Braun-Institute. Vistec is looking forward to contributing with this new, highly flexible lithography system to FBH’s strategy to bridge the gap between research and application”, stated Wolfgang Dorl, General Manager of Vistec Electron Beam.
Media information:
Ferdinand-Braun-Institut für Höchstfrequenztechnik
The Ferdinand-Braun-Institut für Höchstfrequenztechnik (FBH) is one of the world-wide leading institutes for applied research in microwaves and optoelectronics. Based on III-V semiconductors it develops highfrequency devices and circuits for applications in communications and sensor technology. High-power diode lasers with excellent beam quality are produced for materials processing, laser technology, medical technology and high precision metrology. FBH also conducts basic investigations on nitrides for future applications such as short-waved UV light sources or transistors for very high voltages. FBH’s close cooperation with partners in industry and research ensures the rapid transfer of research results into applications. The institute has a staff of 240 employees and a budget of 17.1 million Euro. It is part of the
Forschungsverbund Berlin e.V. (FVB) and is a member of the Leibniz Association.
Vistec Electron Beam Lithography Group
Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures and sells electron-beam lithography equipment based on Gaussian beam technology. Their electron beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA).
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on shaped beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).
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